发明名称 PRESERVATION OF FACE OF SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To preserve the rear face of a semiconductor substrate by a method wherein an adhesive tape is pasted on the rear of the semiconductor substrate, a chemical liquid or a processing agent is sprayed on the surface of the substrate, a one-side etching operation or a one-side polishing operation is executed and, after that, the adhesive tape is stripped off. CONSTITUTION:An adhesive tape 2 is constituted of an adhesive 2a and a base material 2b; the adhesive 2a is set according to a chemical liquid 3 used for an etching operation. The selected adhesive tape 2 is pasted on the rear 1b of a semiconductor substrate 1; the chemical liquid is sprayed on the semiconductor substrate 1; a one-side etching operation or a one-side polishing operation is executed. Even when the chemical liquid 3 reaches the rear 1b during this operation, it is possible to restrain a situation that the chemical liquid 3 comes into contact with the rear face 1b because the adhesive 2a with a chemical- resistant stability exists on the rear face 1b. Thereby, the rear face of the semiconductor substrate 1 is preserved.
申请公布号 JPH02257633(A) 申请公布日期 1990.10.18
申请号 JP19890078982 申请日期 1989.03.30
申请人 KYUSHU ELECTRON METAL CO LTD;OSAKA TITANIUM CO LTD 发明人 TAKAO YOSHIYUKI;KIYOTAKE SHINJI;MATSUO HIROSHI
分类号 H01L21/306;H01L21/304 主分类号 H01L21/306
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