| 摘要 |
PURPOSE:To form a fine pattern of high accuracy by a method wherein a resist pattern after an exposure operation is irradiated with a ray of light containing light of a wavelength in a photosensitive region and, in succession, a heat treatment is executed in such a way that a temperature is raised continuously or intermittently. CONSTITUTION:The following are installed: a light irradiation part 5; a heating part 6 which has been formed in such a way that it is provided with a plurality of temperature regions or that its temperature is changed gradually; a conveyance part 4 which conveys a substrate 1 to be treated from the light irradiation part 5 to the heating part 6. The substrate 1 to be treated is heated and treated at a desired temperature-rise speed while it is being conveyed at a desired conveyance speed. That is to say, a resist pattern after an exposure operation is irradiated with a ray of light containing light of a wavelength in a photosensitive region; a reactive species is produced; then, a heating treatment is executed; a temperature of the produced reactive species is raised continuously or intermittently; after a developing operation, it is baked. Accordingly, it is possible to increase the temperature in accordance with the rise of a heat- resistant property caused by a cross-linking reaction. Thereby, it is possible to obtain a resist pattern whose heat-resistant property and pattern accuracy are high. |
