发明名称 RESIST TREATING DEVICE
摘要 PURPOSE:To enable a highly integrated device to he produced with improved yield by attracting and fixing a cap for covering and a spin cup through a magnet member. CONSTITUTION:A cap for covering 4 and a spin cup 3 are attracted and fixed through a magnet member. 10. Therefore. since a nozzle 6 is securely placed at the cap for covering 4 without deviating from a preset position without being affected by rotary vibration of a spin chuck 2. a resist treating process is not affected poorly. Since the cap for covering 4 is attracted and fixed to the same setting position of the spin cup 3 through the magnet member 10. the resist treating process is performed with high accuracy. Thus. a highly integrated device can be produced with improved yield.
申请公布号 JPH02253609(A) 申请公布日期 1990.10.12
申请号 JP19890073798 申请日期 1989.03.28
申请人 TOKYO ELECTRON LTD;TERU KYUSHU KK 发明人 HAGIO KAZUO
分类号 G03F7/16;B05C11/08;G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/16
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