PLASMA TREATMENT DEVICE

摘要

PURPOSE:To form plasma atmosphere of approximately the same concentration without leaking plasma discharge outside and enclosed space and to enable formation of a coating of good uniformity even on a substrate of a large area by forming the closed space with a substrate susceptor which is movable in one direction and a pair of electrode shields. CONSTITUTION:A pair of shields 4 are provided between a reaction chamber inner wall and a discharge electrode 3. The electrode shield 4 forms a closed space with a substrate susceptor 5 for arranging a plurality of substrates 1 between the discharge electrodes 3 unparallel thereto. The substrate susceptor 5 is movable in one direction, therefore, plasma treatment can be carried out successively by moving the susceptor whereto a plurality of substrates are held before and after plasma treatment.