| 摘要 |
PURPOSE:To quickly conduct the correction and change of pattern, and to obtain the manufacturing methods of a reduction projection aligner, a reticle and a large-scale integrated circuit, and the large-scale integrated circuit, having no trouble of low yield rate by a method wherein a reticle is formed using a material with which the permeability of light will be controlled electrically, and the graphic data to be exposed are transmitted to the electric terminal of the reticle, with which the permeability of light can be controlled. CONSTITUTION:A light transmitting variable reticle 17, formed by the material with which light transmitting property can be electrically controlled, is provided. A part of the exposure data stored in the large-scale external storage device 18, such as a magnetic disc and the like, is passed through an interface circuit 19 as necessary and it is temporarily stored in a bit-mapped memory 20, the temporarily stored part is passed through an interface circuit 22 and given to a light transmitting variable reticle 17 as a bit pattern. A microprocessor 21 transfers the desired exposure data in the bitmap memory 20 to the desired position of a wafer 14 by shifting an XY storage 15, and also it controls in such a manner that the desired exposure pattern, which is converted to the state of presence or non-presence of light transmissivity, is exposed. As a result, no dust is generated when the reticle is replaced, and a device and an LSI manufacturing method, having high degree of flexibility, can be obtained. |
