METHOD FOR PROCESSING ORGANIC CRYSTAL MATERIAL AND ORGANIC CRYSTAL MATERIAL

摘要

PURPOSE:To enable fine processing of an organic crystal material by each using a solvent different in solubility between the organic crystal material and photoresist when the organic crystal material is processed using the photoresist. CONSTITUTION:A resist 3 sensitive to light or electron beam is applied onto an organic crystal material 2 (1 is substrate) and developed to draw a desired pattern (4 is photomask; 5 is pattern drawing part; 6 is ultraviolet ray). Then the organic crystal material 2 is subjected to etching using a solvent capable of dissolving only organic crystal material 2 without dissolving the resist 3. Finally the residual resist 3 is removed (e.g. removed as ash by exposing in oxygen plasma for a short time) to form the thin film 2 of organic crystal material processed into fine pattern on a substrate.