| 摘要 |
<p>PURPOSE:To easily form a spacer for liquid crystal gap without lowering the quality of display by using an insulating film on a part which is not irradiated with light as the spacer for liquid crystal gap. CONSTITUTION:After forming a TFT part 21 including an opaque scanning electrode and an opaque scanning electrode or an opaque signal electrode 22 on a glass substrate 20, an orientation film 23 is deposited and polyimide 24 and resist 25 are successively deposited after a rubbing process, which is irradiated with the light from the glass substrate side. Thereafter, an etching process is performed to the polyimide 24 and the polyimide 24 on the part which is not irradiated with the light is used as the spacer for the liquid crystal gap. Since the spacer for the liquid crystal gap is necessarily formed on the scanning electrode and the signal electrode, the unevenness of the liquid crystal gap in the case of sealing the liquid crystal does not occur. The spacer is not positioned on an effective image part, so that the quality of display is not lowered.</p> |
