| 摘要 |
PURPOSE:To facilitate formation of a uniform high picture quality pattern by a method wherein an adjusting means functions so as to improve a gap accuracy in accordance with the flatness of a photomask measured by a measuring means. CONSTITUTION:The flatness of a photomask 2 is measured first and an adjusting means adjusts a large substrate 1 in accordance with the measured value to cope with the warpage and deformation of the photomask 2. However, the warpage and deformation of the photomask 2 are not always regular and, further, varied from product to product. Therefore, after the state of the flatness of the photomask 2 over the whole surface is measured by a measuring means separately, the flatness of the substrate is adjusted by a flexible chuck 9 provided in the adjusting means, so that even if there is a local deformation in the photomask, the gap accuracy can be maintained steadily. |
