发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device in which excellent low-resistance ohmic contact characteristics can be realized even without providing a so-called cap layer when utilizing an aluminum alloy thin film as an electrode layer in the case of manufacturing a liquid crystal display element or a semiconductor element. SOLUTION: In the semiconductor device which comprises a wafer, a semiconductor layer formed on the wafer and an electrode layer comprising wiring or an electrode, the semiconductor device includes a portion wherein the semiconductor layer and the electrode layer are directly bonded, and the electrode layer is formed from the aluminum alloy thin film containing transition metals such as nickel, cobalt, iron and the like. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004363556(A) 申请公布日期 2004.12.24
申请号 JP20040090315 申请日期 2004.03.25
申请人 MITSUI MINING & SMELTING CO LTD 发明人 IKEDA MAKOTO;KUBOTA TAKASHI
分类号 H01L21/28;G02F1/1343;G02F1/1368;H01L21/3205;H01L21/768;H01L23/52;H01L29/786;(IPC1-7):H01L21/28;H01L21/320 主分类号 H01L21/28
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