| 摘要 |
Photosensitive element for retaining electrostatic charge images has an electroconductive substrate (I) with a photosensitive, photoconductive coating (II). The novelty is that (II) has a protective coating (III) of insulating and light-transmitting spot. Pref. the max. dimension (W) of each spot is max. 200 microns and the closest distance (L) between adjacent spots is max. 200 microns, whilst the ratio L/W is 1 or less. (III) is 0.01-5 microns thick. The spots have an electrical resistance of min. 10power-10 ohm.cm.. The spots consist of amorphous C, pref. contg. halogen, 5-50 mole% H or a gp. III or V element; a metal oxide, nitride, fluoride, carbide or sulphide; or amorphous Si, pref. contg. C. The spots pref. are circular, oval or square in shape and regularly arranged or irregular in shape and statistically arranged. (II) consists of photoconductor material, pref. an organic photoconductor, dispersed in a binder resin; a charge carrier generating layer and a charge carrier transport layer; Se; or amorphous Si. A resin layer (IV) may be formed between (II) and (III). A combination of an amorphous Si photoconductor and a (discontinuous) protective coating of thermoplastic or thermosetting resin may also be used.
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