发明名称 |
Optical Mask For Measuring An Aberration Of Beam And Method Of Measuring The Aberration Using The Same |
摘要 |
An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a predetermined reference direction. A comparative pattern is formed on the mask substrate. The comparative pattern is adapted to direct the exposure beam to travel in a direction inclined at a predetermined angle with respect to the reference direction. |
申请公布号 |
KR100660536(B1) |
申请公布日期 |
2006.12.22 |
申请号 |
KR20040109830 |
申请日期 |
2004.12.21 |
申请人 |
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发明人 |
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分类号 |
H01L21/027;G01M11/02;G03F1/44;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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