DEVICE FOR TREATING SILICON WAFER IN ACID BATH

摘要

PURPOSE: To make the exchange of resistors to be performed easily and safely by laying tubular quartz ducts across a tank in such a state that one ends of the ducts are closed and other ends are opened on one side face of the tank. CONSTITUTION: A tank 1 is provided with tubular quartz ducts 5 near its base section, namely, the bottom section and the ducts 5 are closed at one end 6 sides and opened on one side face 8 of the tank 9 on the other end 7 sides. Heating elements 13 housed in the tank 1 for heating acid are respectively inserted into the duct 5 through the openings 7. The elements 13 are composed of electrical resistors 14 housed in quartz cases or sheaths 15. Therefore, when one of the resistor 14 is damaged, the corresponding heating element 13 can be easily exchanged with a sound one.