发明名称 High purity titanium used as cathodic sputtering target - in molten salt electrolytic cell, with parts contacting electrolyte made of nickel to avoid titanium contamination
摘要 High purity Ti is produced by feeding the Ti raw material into a molten salt electrolysing appts in which the parts which contact salt melt are made of high purity.N. USE/ADVANTAGE - Making high purity Ti used as target material in cathodic sputter coating. Ni does not lead to impuritiess in the Ti ppte contg max 0.1 ppm alkali metal, max 1 ppb radioactive elements and max 100 ppm oxygen.
申请公布号 DE4004575(A1) 申请公布日期 1990.08.16
申请号 DE19904004575 申请日期 1990.02.14
申请人 NIPPON MINING CO., LTD., TOKIO/TOKYO, JP 发明人 NISHIMURA, EIJI, SAITAMA, JP;KUROKI, MASAMI, URAWA, SAITAMA, JP;KIKUTAKE, NAOYUKI, TAMA, TOKIO/TOKYO, JP;SHINDOU, YUUICHIRO, URAWA, SAITAMA, JP
分类号 C23C14/34;C25C3/28;C25C7/00 主分类号 C23C14/34
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