| 摘要 |
An aq. acid bath of the chloride and/or sulphate type for the galvanic deposition of a zinc-nickel alloy contains zinc ions, nickel ions, at least one aromatic cpd. with O, S and N and a cpd. from the following gps. (a) aromatic sulphonic acids, (b) aromatic sulphonamides, sulphonimides and mixed carboxamide/sulphonamide, (c) acetylenic alcohols as well as salts of (a) and (b) and mixts. Components (b) and (c) are present in an amt. of at least 0.0001 mol./l and components (a), (b) and (c) for baths of the chloride and chloride-sulphate type in an amt. of at least 0.001 mol./l. A prim. polishing agent, e.g. a polyoxyalkylene cpd. or polyacrylamide may also be present.
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