发明名称 PRODUCTION OF SPUTTERING TARGET FOR FORMING SUPERCONDUCTING CERAMIC FILM
摘要 PURPOSE:To produce the target for forming a film excellent in superconductivity by mixing Ba carbonate powder and an excess of Cu oxide powder over the specified amt. to be mixed, calcining the mixture under specified conditions, crushing the calcined material and hot-pressing the crushed material. CONSTITUTION:The Ba carbonate powder and Cu oxide powder or the Sr carbonate powder, Ca carbonate powder, and Cu oxide powder or the Ba carbonate powder, Ca carbonate powder and Cu oxide powder are mixed. In this case, an excess of the Cu oxide powder over the carbonate powder by 0.1-10wt.% with respect to the equimolar ratio is added. The obtained mixture is held at 750-980 deg.C for 8-40hr, and calcined. Consequently, the multicomponent oxide of Ba, etc., and Cu free of residual carbonate ion is obtained. The oxide is crushed, and the powder is hot-pressed to obtain a sputtering target. By using this target, a superconducting ceramic film free of C as the impurities and excellent in superconductivity is obtained.
申请公布号 JPH02200774(A) 申请公布日期 1990.08.09
申请号 JP19890022391 申请日期 1989.01.31
申请人 MITSUBISHI METAL CORP 发明人 OUCHI YUKIHIRO;SUGIHARA TADASHI;TAKESHITA TAKUO
分类号 C23C14/34;C01G3/00;C01G15/00;C01G29/00;C04B35/45;C23C14/08;H01B12/06;H01B13/00;H01L39/24 主分类号 C23C14/34
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