发明名称 Ophthalmic measurement apparatus.
摘要 <p>An ophthalmic measurement apparatus in which a laser beam is projected at a selected spot (P) in a patient's eye (E) and light scattered therefrom is photoelectrically detected through a mask (21) by a photodetector (22) and processed for ophthalmic measurement. The apparatus is provided with an alignment index (41), which is disposed at a position conjugate with the mask and projected on the selected spot. The alignment index appears to be on the point of converged laser light and a pseudo-image (21a) of the mask can be observed at the point (P) in the eye where the laser light converges. This enables the system to be aligned with ease relative to the eye to be examined.</p>
申请公布号 EP0380260(A2) 申请公布日期 1990.08.01
申请号 EP19900300609 申请日期 1990.01.22
申请人 KOWA COMPANY LTD. 发明人 AKIYAMA, KOICHI
分类号 A61B3/10;A61B3/117;A61B3/12;A61B3/14;A61B3/15 主分类号 A61B3/10
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