发明名称 Ion optical system for mass spectrometer
摘要 A mass spectrometer includes: a plasma generation device for generating plasma for ionizing an introduced sample; an interface device for drawing the plasma into vacuum; an ion lens device for extracting and inducing ions as an ion beam from the plasma; a collision/reaction cell for removing an interference ion from the ion beam; a mass analyzer or filter for allowing a predetermined ion in the ion beam from the collision/reaction cell to pass along a first axis based on a mass-to-charge ratio; an ion detector for detecting the ion; an ion deflection device before the mass analyzer, and also an ion deflection device between the mass analyzer and the ion detector. The mass spectrometer reduces background noises in a mass analyzer by removing neutral particles from the ion beam without reducing the measurement sensitivity on ions to be analyzed as much as possible.
申请公布号 US9418826(B2) 申请公布日期 2016.08.16
申请号 US201414571858 申请日期 2014.12.16
申请人 Agilent Technologies, Inc. 发明人 Hirano Kazushi;Kitamoto Jun
分类号 H01J49/26;H01J49/06;H01J49/42 主分类号 H01J49/26
代理机构 代理人
主权项 1. A mass spectrometer, comprising: a plasma generation device for generating plasma for ionizing an introduced sample; an interface device for drawing the plasma into vacuum; an ion lens device for extracting and inducing ions as an ion beam from the plasma; a mass analyzer for allowing a predetermined ion in the ion beam to pass along a first axis based on a mass-to-charge ratio; an ion detector for detecting the ion; at least one first ion deflection device disposed prior to the mass analyzer to conduct ion deflection; and at least one second ion deflection device disposed between the mass analyzer and the ion detector and configured to generate an electric field to deflect and induce the predetermined ion having passed the mass analyzer along the first axis so as to be along a second axis to the ion detector, wherein the at least one second ion deflection device comprises a first electrode positioned to deflect the ion beam toward the second axis in response to application of a voltage to the first electrode, and at least one additional electrode positioned on a side of the ion beam opposite to the first electrode.
地址 Santa Clara CA US