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发明名称
PHOTORESIST COMPOSITION CONTAINING A NOVOLAK RESIN
摘要
申请公布号
EP0118291(B1)
申请公布日期
1990.07.11
申请号
EP19840301389
申请日期
1984.03.02
申请人
SUMITOMO CHEMICAL COMPANY, LIMITED
发明人
FURUTA, AKIHIRO;HANABATA, MAKOTO;YASUI, SEIMEI;HIROAKI, OSAMU;JINNO, NAOYOSHI
分类号
G03F7/023
主分类号
G03F7/023
代理机构
代理人
主权项
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