| 摘要 |
A process for forming photoresist images by sticking photosensitive layer formed on a film of a polyvinyl alcohol resin which is not soluble in water, but is swellable with water, to a substrate, exposing the photosensitive layer to light through the polyvinyl alcohol resin film, washing away the polyvinyl alcohol resin film with water and developing the photosensitive layer with a developer. |
