| 摘要 |
<p>PURPOSE:To form a uniform and highly accurate pattern by using a temperature-sensitive resist by a method wherein a substrate is carried, via a conveyance chuck, to a stage, for exposure and alignment use, in which a vacuum suction groove and the like have been formed so as to correspond to the whole rear of the substrate and which is provided with a cooling function. CONSTITUTION:A substrate is carried in by using a chuck formed of branched pipes 1a which are connected to a freely ascending and descending shaft 5 via a gear 6, which are formed by avoiding vacuum-suction grooves 2 formed so as to correspond to the whole rear of the substrate at a substrate suction face 4a of a stage main body 4 and which are vacuum-sucked; it is vacuum- sucked uniformly and flat to the flat face 4a having no recessed part; it is cooled by a cooling function of the main body 4 by using the cooling water flowing in a cooling pipe 3. Accordingly, a uniform and highly accurate pattern can be formed by using a temperature-sensitive resist by a photolithographic method using an alignment and exposure operation by means of the stage.</p> |
