发明名称 WAFER SURFACE GRINDER
摘要 PURPOSE:To enhance the evenness in the flatness and the ground surface by a method wherein the spindle axles in the first and second positions are respectively fitted with the rough grinding and medium grinding blades by down-feed system while the third position is fitted with the finish grinding blade by through-feed system. CONSTITUTION:Chuck tables 5 provided on five positions on a rotary table 4 respectively pass through the five positions by the rotation of the table 4. Firstly, a wafer to be ground up is sucked at a load point 6 and successively rough, medium and finish ground at the first, second and third spindle axles 1, 2 and 3 finally to be taken out of the unload point 7. During the grinding processes at the axles 1, 2 under heavy grinding load, the down-feed system is applied to assure the thickness precision and the flatness while at the axle 3 for finish grinding, the through-feed system is applied to form an evenly ground surface. Through these procedures, the evenness in the flatness an the ground surface can be enhanced.
申请公布号 JPH02153528(A) 申请公布日期 1990.06.13
申请号 JP19880308211 申请日期 1988.12.05
申请人 NEC CORP 发明人 TERADA HITOSHI
分类号 B24B7/04;B24B37/12;H01L21/304 主分类号 B24B7/04
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