| 摘要 |
PURPOSE:To enable a photographic plate mask to match with high-accuracy by using striped alignment marks as alignment marks for the photographic plate mask matching. CONSTITUTION:In a case (A) wherein there is a shift horizontally and vertically to the paper surface, a characteristic interference fringe pattern appears where both the mask-stripe alignment marks 2 and wafer-stripe alignment marks 3 overlap to each other owing to their regular shift and the fine shift is detected while amplified. In a case (B) wherein there is a rotation-directional shift, a moire pattern is formed at the overlapping part between both striped alignment marks owing to the shift between both the alignment marks 2 and 3. The interference fringe pattern between those striped alignment marks is generated to detect a finer mask matching shift than before, and the mask matching shift can be corrected with high accuracy. |
