| 摘要 |
PURPOSE:To obtain a photoresist compsn. having improved sensitivity to rays having a wavelength in a region of deep ultra-violet rays and excimer laser light, and having also improved resolving power and contrast by incorporating a specified alkali-soluble resin and a photosensitive agent which prompts or inhibits the solubility of the resin in alkali by the irradiation with active rays, into the compsn. CONSTITUTION:An alkali soluble resin constituted of a unit consisting of a cyclic aliphatic hydrocarbon skeleton, a unit derived from maleic anhydride and/or a unit based on maleimide, is used as base resin. Suitable photosensitive agent is one which prompts or inhibits the alkali solubility of the resin by the irradiation with active rays when it is mixed with the alkali-soluble resin, generating a large difference of solubility between an exposed part and an unexposed part, and forming a positive or negative picture by a succeeding development with an aq. alkali. Thus, a photoresist compsn. having high resolving power and high contrast to deep ultraviolet rays and excimer laser light, having also high sensitivity is obtd. |
