| 摘要 |
PURPOSE:To enable an alignment to be made rapidly by a method wherein the specified positions of patterns formed on a wafer and a mask respectively are computed to make the alignment of both the patterns in conformity with the relative slips from each other. CONSTITUTION:The alignment light 2 emitted from an alignment system 1 is reflected on a translucent mirror 3 and a shifting mirror 4 to irradiate a reticle (mask) 5. The transmitted light passing through a projection lens 7 enters into a wafer 8. The reflected light reverses and transmits to be focussed on an image pick-up element 10 through an optical system 9. The output is inputted to a pattern data processing circuit 11 to store the data in a memory circuit 12. On the other hand, the specified positions of the alignment pattern of the reticle 5 and the wafer 8 are made coincident with each other by shifting a stage 15 using a stage driver 13 to shift the wafer 8. The shifting amount of the stage 15 is measured by interferometers 16, 16' to furnish the measured data to the said processing circuit 11 so that the relative slips between both the patterns may be computed to be transferred to the driver 13 for making alignment of the reticle 5 with the wafer 8. |
