Thermo-enhanced electron image projector

摘要

An electron image projector (10) is exposed to a heat source (22) to induce the emission of electrons (20) which flow from a pattern (14) of a mask (12) to a photoresist layer (18) of a substrate (16). An electron field (26) is applied across the substrate (16) and the mask (12) to accelerate the electrons (20) from the pattern (14) to the photoresist layer (18) to form a shape (24) on the photoresist layer (18) which reproduces the shape of the pattern (14). A projection system (28) can be disposed between the substrate (16) and the mask (12) to selectively direct the plurality of electrons (20) from the pattern (14) to the photoresist layer (18).