| 摘要 |
PURPOSE:To eliminate the pattern abnormality based on the nonuniform spacing between a photomask and a substrate with a photosensitive resin by providing >=3 layers of light transmittable layers respectively having prescribed refractive indices between a light transparent substrate and light shieldable patterns. CONSTITUTION:The 1st light transmittable layer 2 consisting of a low-refractive index material, the 2nd light transmittable layer 3 consisting of a high-refractive index material and the 3rd light transmittable layer 4 consisting of the low- refractive index material are formed on the light transparent substrate 1 consisting of a glass plate, etc. The light shieldable patterns 5b consisting of a Cr film, etc., are formed on the layer 4. Molybdenum oxysilicide, etc., are usable for the layer 2, molybdenum nitrosilicide, etc., for the layer 3, and silicon oxide, etc., for the layer 4. These layers are formed by a sputtering treatment, etc. The resist patterns faithful to the patterns 5b are obtd. even if there is the nonequal spacing between the mask and the substrate if such mask is used. |
