发明名称 Semiconductor wafer and epitaxial growth on the semiconductor wafer with autodoping control and manufacturing method therefor
摘要 A semiconductor wafer on which silicon or the like is epitaxially grown and p-type or n-type impurities are doped and which has at the rear surface except for the peripheral edge portion thereof a blocking film for preventing jumping out of impurities therefrom which causes auto-doping, thereby preventing silicon particles from being produced at the peripheral surface and preventing the semiconductor wafer from being contaminated by the silicon particles during the manufacturing of a semiconductor device.
申请公布号 US4925809(A) 申请公布日期 1990.05.15
申请号 US19880214501 申请日期 1988.07.01
申请人 OSAKA TITANIUM CO., LTD.;KYUSHU ELECTRONIC METAL CO., LTD. 发明人 YOSHIHARU, TETSUJIRO;KAMISE, HARUO
分类号 H01L21/20;H01L21/22;H01L21/311;H01L21/314 主分类号 H01L21/20
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