| 摘要 |
PURPOSE:To prevent a pattern from being disordered in cyclic period by a method wherein the bits of a cyclic pattern are specified in numbers in the formation of a pattern of a charge coupled color line sensor whose pattern is formed through a divided exposure method. CONSTITUTION:As the number of bits of a cyclic pattern formed through divided exposure is a multiple of 12, even if there are cycles of a three-cyclic period such as (R, G, B), (Ye, Cy, G), or the like and a four-cyclic period such as (R, G, B, W), (Ye, Cy, G, W), or the like, the cyclic pattern, which is a multiple times as many as these cyclic units, is exposed to light in a lump through a divided exposure method. Therefore, the cyclic pattern is prevented from being disordered in cyclic period at the joint between the regions exposed to light in a divided manner. Through a divided exposure using a reduced projection exposure device, the pattern formation of even a large scale charge coupled color line sensor whose chip length is larger than 20mm can be protected from defects. The length of a color line sensor capable of being manufactured is restricted only by the diameter of a semiconductor wafer 6 to be employed. |
