| 摘要 |
PURPOSE:To detect a precise alignment position without being affected by a photo resist film, a flattened film, etc., on a registering pattern by detecting the position of the registering pattern by using the combined signal of a signal of reflected light from a semiconductor substrate and a signal of scattered light therefrom. CONSTITUTION:After a registering pattern 2 is formed on a semiconductor substrate 3, a photo resist film 1 is formed on the pattern 2, so as to be asymmetric with respect to the pattern 2. Laser light is projected on the substrate 1; the light intensity signal of the reflected light is designated by A, and that of the scattered light is designated by B. A combined signal C is obtained by combining the light intensity signal A of the reflected light and the light intensity signal B of the scattered light. By using the combined signal C, the registering pattern 2 which is scarcely affected by the resist film 1 is formed. |
