发明名称 MEASUREMENT OF RESIST PATTERN LENGTH
摘要 PURPOSE:To restrict irregular reflection of light from a high-reflection substrate and enable stable, improved optical length measurement to be made by applying polyimide soluble in an organic solvent. CONSTITUTION:When polyimide soluble to an organic solvent is spin-applied to the substrate 1 including a resist pattern 3 on a high-reflection substrate 1 such as Al film on a semiconductor substrate 2, to form a polyimide thin film 4, optical irregular reflection from the substrate 1 to 1/2, etc., is restricted. As a result, resist pattern can be optically measured by stably and properly, thus obtaining a highly reliable measurement result.
申请公布号 JPH02116113(A) 申请公布日期 1990.04.27
申请号 JP19880268081 申请日期 1988.10.26
申请人 MATSUSHITA ELECTRON CORP 发明人 FUKUMOTO HIROBUMI;OKUDA YOSHIMITSU;TAKASHIMA YUKIO;OKUMA TORU
分类号 G01B11/02;H01L21/027;H01L21/66 主分类号 G01B11/02
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