Positive type photoresist developer.

摘要

A positive type photoresist developer which cbmprises an aqueous solution of quaternary ammonium hydroxide represented by the general formula; <CHEM> (wherein all the symbols are as defined in the appended claims) and hydrazine or hydrazine and a nonionic surfactant is disclosed. The developer can form a fine pattern having a high degree of resolution and can provide an excellent profile with little irregularities in pattern dimensions.