发明名称 Electronic optics device with variable illumination and aperture limitation, and application thereof to an electron beam lithographic system
摘要 An electronic optics device with variable illumination and aperture limitation is provided including, between a particle source and an object an image of which it is desired to project in an image plane, a set of three lenses with electronically controllable focal lengths, the first one being situated as close as possible to the source and associated, in its main plane or in the vicinity of this plane, with an aperture limitation diaphragm, the object being placed in the main plane of the third lens or in the vicinity thereof, the focal length of these three lenses being controlled so as to give to the section of the electronic beam in the object plane a value determining the desired illumination and to the image of the diaphragm a diameter and a position determining the desired aperture of the beam.
申请公布号 US4918318(A) 申请公布日期 1990.04.17
申请号 US19870112671 申请日期 1987.10.14
申请人 THOMSON-CSF 发明人 DE CHAMBOST, EMMANUEL;SONRIER, MICHEL
分类号 H01J37/10;H01J37/153;H01J37/30;H01L21/027 主分类号 H01J37/10
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