| 摘要 |
PURPOSE:To improve the sensitivity of the subject material by processing the photosensitive material incorporated with a specified compd. and a specified compd. selected from conductive metal oxides, with a developer having a specified sulfurous acid concn. CONSTITUTION:The photosensitive material is developed with the developer contg. the sulfurous acid concn. of >=30g ion/l, and contains a silver halide particle contg. 0.1-3.5mol.% of silver iodide, the compd. shown by formulas I-III, and the compd. optionally selected from the compd. group of the conductive metal oxide contg. Zn, Ti, Sn, Al, In, Si, Mg, Ba, Mo, W or V, as a main component. In formulas R<0>, R2, R4-R6, R10, R19-R22 are each hydrogen atom or alkyl group, etc., A is oxyalkylene group, R<1> and R<3> are each alkyl or alkoxy group, etc., R<11>-R<18> and R<23>-R<25> are each hydrogen or halogen atom or alkyl group, etc., (p)-(r) are each an average degree of polymerization of alkylene oxide of 2-50, R is alkyl group, (n) is an integer of 1-50. Thus, the sensitivity of the photosensitive material is improved. |
