PLASMA TREATING DEVICE AND PLASMA TREATMENT,申请号JP19880212890-传众专利搜索

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发明名称	PLASMA TREATING DEVICE AND PLASMA TREATMENT
摘要
申请公布号	JPH0261071(A)	申请公布日期	1990.03.01
申请号	JP19880212890	申请日期	1988.08.26
申请人	SEMICONDUCTOR ENERGY LAB CO LTD	发明人	TSUCHIYA MITSUNORI;KAWANO ATSUSHI;YAMAZAKI SHUNPEI
分类号	C23C16/50;C23C16/27;C23F4/00	主分类号	C23C16/50
代理机构		代理人
主权项
地址

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