| 摘要 |
Disclosed is a micro gas flow rate control valve which is used in semi-conductor producing system operated under a high vacuum or various apparatus for analysis. The valve uses combination of a flat surface valve tip and a flat surface valve seat of cylindrical shape, and is capable of controlling minute flow and durable even used under severe conditions of high pressure differences and large temperature changes to have stable performance. Also enclosed is a metal-ceramics sealing mechanism suitable for the above valve. The sealing mechanism uses, in addition to a sealing member made of a soft metal, a seal assisting member, and durable under the conditions of repeated temperature changes.
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