发明名称 MANUFACTURE OF SPUTTERING TARGET
摘要 PURPOSE:To manufacture a sputtering target free from the occurrence of cracks and blowhole by constituting one surface of a mold by the use of a material with superior thermal conductivity and applying heating to the above surface up to a specific temp. CONSTITUTION:A ternary-system material, such as Tb-Fe-Co, is cast in a mold. A material with superior thermal conductivity is used for forming one surface of the above mold, such as a bottom 1, and this surface 1 is heated up to >=200 deg.C by means of a heater 4, etc., by which a difference in temp. between the vicinity of the center and the vicinity of outside periphery at the time of cooling is reduced. By this method, stress cracking due to the rapid cooling of the cast molten metal can be prevented, and the rare earth-transition metal alloy target free from the occurrence of cracks and blowhole can be manufactured.
申请公布号 JPH0257682(A) 申请公布日期 1990.02.27
申请号 JP19880207688 申请日期 1988.08.22
申请人 SEIKO EPSON CORP 发明人 AOYAMA AKIRA;SHIMOKAWA TADASATO;YAZAKI CHIKAO;YAMAGISHI TOSHIHIKO
分类号 C23C14/34;G11B11/10;G11B11/105;H01F41/18 主分类号 C23C14/34
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