| 摘要 |
PURPOSE:To improve the adhesive property between an underlying material layer and a photoresist by bringing a specific compd. into reaction with the surface of the underlying material layer, thereby executing the surface treatment thereof. CONSTITUTION:The surface treatment of the underlying material such as silicon substrate is executed by bringing the vapor of a silane coupling agent having an arom. ring, for example, dimethyl phenyl chlorosilane 2 into reaction on a silicon oxide film 1 on the surface of the above-mentioned material. A photoresist film is then formed on this surface and is subjected to exposing and development processing to form fine patterns. The similar processing with a substrate having no oxide film 1 is possible as well. |
