| 摘要 |
PURPOSE:To reduce photoreflection on the thin film surface by laminating two layers of a specific dielectric thin film having a limited refraction factor on a transparent conductive thin film consisting of indium oxide provided on the surface of a transparent plastic base material or of a composite oxide of this and tin oxide. CONSTITUTION:A transparent conductive thin film 2 is formed on the surface of a transparent plastic film base material 1 and further thereon an inorganic oxide thin film 3 (the lower side dielectric thin film) having a refraction factor 1.9 to 2.2 and an inorganic oxide thin film or a fluoride thin film 4 (the upper side dielectric thin film) having a refraction factor less than 1.5 are formed in this order. The film thickness of the lower side conductor thin film 3 is in the range, whose upper limit is about 2000Angstrom while the film thickness of the upper side dielectric thin film 4 is about 800 to 1200Angstrom . Thereby, photoreflection on the thin film surface can be reduced. |
