| 摘要 |
PURPOSE:To prevent the dimensional variation and the defects in shape of a pattern by applying a water-soluble resin on a photosensitive resin film formed on a substrate plate, exposing the formed resin film, heating and then developing it. CONSTITUTION:A water-soluble resin film 3 is formed on the substrate before exposing it, and then exposed, heated, followed by being developed to form a pattern 2A. Namely, the defects in the edge part of the pattern due to the post-exposure backing (PEB) of the resin film are solved by the function of the water-soluble resin. This is a reason that the nonuniformity in the edge part of the pattern due to the diffusion phenomenon of a photosensitive substance contd. in the resist by PEB is uniformized by the action of a film 3 brought from the upper part of the resist 2. And, the water-soluble resin is exemplified by pullulan, polyvinyl alcohol, polyvinyl pyrrolidone, poly(parastyrene sulfonic acid), etc., or a mixture thereof. Thus, a fine pattern with high aspect ratio and high dimensional accuracy, is formed. |
