| 摘要 |
<p>The invention relates to a process for the production of a metal screen by irradiating a metal basic layer with high-energy, focused radiation, wherein at least one metal basic layer (3) to be perforated to form a screen is supported in intimate contact on both opposite surfaces during the irradiation by a supporting element (1, 5) adapted to the shape of the metal basic layer (3), using a release layer (2, 4) between a supporting element (1, 5) and the opposite surface of the metal layer (3), and after perforation the two supporting elements (1, 5) and the release layers (2, 4) are removed. According to the present process it is also possible to produce several screens at the same time by using a stack of metal basic layers (3, 3', 3''), between which release layers (2', 2'') are present. The metal basic layer (3, 3', 3'') is a copper or nickel-containing compound, preferably copper. The release layer (2, 2', 2'') used is a layer of a metal compound, preferably a metal oxide or metal sulphide layer, and is preferably formed by conversion. The invention further relates to a device for the production of a metal screen, comprising a metal basic layer and a supporting element adapted to the shape of the basic layer, and means for the production of perforations, wherein the device is also provided with means for applying of a release layer (2, 2', 2'', 4) between a supporting element (1, 5) and the opposite surface of the metal basic layer (3, 3', 3''), and means for the removal of the supporting elements (1, 5) and the release layers (2, 2', 2'', 4) after the perforation operation.</p> |
