发明名称 |
METHOD FOR DISCONNECTING INTERCONNECTION USING FOCUSED ION BEAM |
摘要 |
A method of disconnecting an interconnection (43) using a focused ion beam. A portion to be disconnected of an interconnection formed on a semiconductor substrate (41) to connect semiconductor elements formed in the substrate is aligned with an ion beam irradiating location, and a focused ion beam generated from a focused ion beam source is irradiated onto the interconnection to etch the interconnection by sputtering so that the interconnection is disconnected. |
申请公布号 |
EP0124358(B1) |
申请公布日期 |
1990.02.14 |
申请号 |
EP19840302827 |
申请日期 |
1984.04.26 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TAKIGAWA, TADAHIRO C/O PATENT DIVISION |
分类号 |
H01L21/3205;H01L21/768;H01L21/82;H01L23/52;H01L23/525 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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