| 摘要 |
This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called "substrates") used for production of reticle and photo masks or of glass substrates used for liquid crystal display. It features that said coating equipment comprises of a substrate table (spin head) being formed on the upper part of the spindle, a through hole whose dimension is a little larger than said substrate and whose section is of a reversed-U shape to said spin head being prepared at the central part of the upper part thereof, an aerial stream control frame body having a peripheral wall of a specified height and being provided with an air exhaust hole on said peripheral wall side, both said through hole and said aerial stream control frame body being able to rotate altogether, a doughnut-like cup being provided and arranged so that said aerial stream control frame body can be wrapped at the inside center thereof, an air suction hole of a little higher dimension than the height of the peripheral wall side of said aerial stream control frame body being drilled at the internal face thereof, and the bottom of said cup is interconnected to a pipe equipped with an exhaust fan.
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