Method of forming an oxide liner and active area mask for selective epitaxial growth in an isolation trench,申请号US19890342156-传众专利搜索

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发明名称	Method of forming an oxide liner and active area mask for selective epitaxial growth in an isolation trench
摘要
申请公布号	US4900692(A)	申请公布日期	1990.02.13
申请号	US19890342156	申请日期	1989.04.24
申请人	MOTOROLA, INC.	发明人	ROBINSON, F. J.
分类号	H01L21/76;H01L21/74;H01L21/763	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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