| 摘要 |
Process for gas phase deposition of titanium compounds on a substrate. This process consists in heating the substrate to be coated to a temperature of between 400 and 1000 DEG C, at a total pressure of between 5 x 10<-3> and one atmosphere, and in subjecting it to the action of a gaseous mixture consisting of a carrier gas and a gaseous compound donating titanium and carbon and optionally nitrogen, this gaseous compound being produced by an organotitanium compound. Application to the coating of metal or other articles subjected to severe operating conditions, in order to reduce their friction coefficient and/or their wear.
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