| 摘要 |
PURPOSE:To provide a device which permits film formation under stable glow discharge, by disposing flow regulating plates having plural through-holes in the passages for raw material gases and waste gases in a reaction vessel thereby making the flow of the gases uniform and the compsn. of the gases in the vessel uniform. CONSTITUTION:A supporting base 12 consisting of a quartz plate is installed in a reaction vessel 11 provided with a supply port 17 and a discharge port 29 for gases, and the 1st electrode 13 to be disposed thereon with samples 14 and a heater 15 for heating the samples 14 are placed thereon. The 2nd electrode 16 which is anode is provided above the base 12 by facing the 1st electrode 12 which is cathode spacially therefrom. Flow regulating plates 26, 28 respectively having many through-holes 25, 27 are placed on the side of a supply port 17 and a discharge port 29 for gases. Then the flow of the gases introduced from a supply means for raw material gases through the port 17 is made uniform in the vessel 11 and stable glow discharge is generated between the electrodes 13 and 15, whereby the stable films are formed uniformly on the samples 14. |
