X-RAY EXPOSURE APPARATUS

摘要

The X-ray exposure appts. has a low attenuation chamber supplied with a gas absorbing X-rays. The low attaenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer. A detector senses a mixed composition of gas in the low attenuation chamber. Another device controls a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detector. A quantity of exposure of the X-ray irradiated on the mask is adjusted in accoradance with an output signal of the detector.