发明名称 ATTACHING LEAD OF SEMICONDUCTOR DEVICE
摘要 The semiconductor device with excellent electrical characteristics in high temperature, high humidity conditions includes a bonding wire (23) connecting a bonding pad (24) on the device to a lead electrode (25) on a copper(alloy) lead frame (22), the bonding wire being of aluminium (Al) and the thickness of the reaction layer between the bonding wire and the lead electrode being 0.2 micron or more. The method is claimed in which a fusion connection is effected to make the reaction layer thickness between the copper(alloy) and the aluminium of 0.2 micron or more.
申请公布号 KR900000439(B1) 申请公布日期 1990.01.30
申请号 KR19850006793 申请日期 1985.09.17
申请人 TOSHIBA CORP. 发明人 BABA HIROYUKI;MATSUJAKI DAKASI
分类号 H01L21/60;B23K20/233;H01L21/48;H01L23/49;H01L23/495 主分类号 H01L21/60
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