| 摘要 |
PURPOSE:To obtain fine patterns with high contrast by incorporating a mixture of each secondary to quaternary amine into a developer. CONSTITUTION:A secondary amine and a tertiary amine are mixed with a quaternary amine. Since sec. amines and tert. amines have generally higher alkalinity than quat. amines, a same degree of alkaline normality of a developer may be attained with less sec. and tert. amine. Moreover, a difference of dissolution velocity between an exposed part and an unexposed part of a resist may be increased by the use of such amine mixture, because the effect of the amine as an alkaline agent is almost unexhibited on a mask edge part to be exposed to weak contrast light which is regarded as an unexposed part or on an unexposed part, due to differences of intermolecular forces in different amine compds. in an amine mixture. The effect is not so distinguished as in a developer contg. a single amine component. Thus, fine patterns are obtd. with a high contrast. |
