发明名称 MASK LAYOUT DATA EDITING METHOD
摘要 PURPOSE:To shorten the design period of layout data by inspecting design rules concerning editing data immediately after editing. CONSTITUTION:Mask layout data 21 are displayed on a screen and stored in a storage means 22. Next, all design rules related to an attribute (for example, a mask level) which the data to be edited have are taken out of a design rule storage means 23 and stored into a storage means 24 again. The maximum value of dimensions specified by the design rules is taken out. Overlapping parts are removed from the data stored in a storage means 25 and as the design rules stored in the storage means 24 are referred to, the design rules are inspected. Here, when a violation of the design rules is discovered, an alarm is given immediately and they are edited again.
申请公布号 JPH0228883(A) 申请公布日期 1990.01.30
申请号 JP19880179587 申请日期 1988.07.19
申请人 MATSUSHITA ELECTRON CORP 发明人 NAGASHIMA ATSUSHI;NISHIDA HARUHI;HAYASHI NAOKI
分类号 H01L21/82;G06F17/50;H01L21/027;H01L21/30 主分类号 H01L21/82
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