| 摘要 |
PURPOSE:To improve productivity by subjecting a substrate surface patterned by a material which is different in the tendency to forming of a dye recording layer by an ozone treatment from a substrate to the ozone treatment, then forming the dye recording layer on the surface of this substrate. CONSTITUTION:The thin film of the material which is different in the tendency to reforming of the dye recording layer by the ozone treatment from the sub strate, prescribed a resist 3 of a photosensitive resin, is formed. The thin film of the resist 3 is then exposed through a photomask 5 by irradiation of light 6 of the wavelength to which the thin film of the photosensitive resin is sensi tive; thereafter, the resist is subjected to a development processing, by which the part irradiated with the light 6 is made to remain as the patterned resist 3a and the part not irradiated with the light 6 is removed. The ozone treating part 2a of the part conforming to the shape of the preformat pattern of the substrate 2 is ozone-treated when the substrate surface formed with the resist 3a is subjected to the ozone treatment. Further, a soln. prepd. by dissolving an org. dye into a solvent is coated thereon to form the dye recording layer 1. The production process is simplified in this way and the productivity is im proved. |
